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Unified Diff: include/effects/SkEmbossMaskFilter.h

Issue 395603002: Simplify flattening to just write enough to call the factory (Closed) Base URL: https://skia.googlesource.com/skia.git@master
Patch Set: Created 6 years, 4 months ago
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« include/core/SkImageFilter.h ('K') | « include/effects/SkDropShadowImageFilter.h ('k') | include/effects/SkLayerRasterizer.h » ('j') | src/effects/SkLightingImageFilter.cpp » ('J')
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Index: include/effects/SkEmbossMaskFilter.h
diff --git a/include/effects/SkEmbossMaskFilter.h b/include/effects/SkEmbossMaskFilter.h
index a1e2af46ce0981e24497c058e68b9446e1e640dd..74895fb0cf32e8fbb6d0f3c5467a8596c260a273 100644
--- a/include/effects/SkEmbossMaskFilter.h
+++ b/include/effects/SkEmbossMaskFilter.h
@@ -37,7 +37,9 @@ public:
protected:
SkEmbossMaskFilter(SkScalar blurSigma, const Light& light);
+#ifdef SK_SUPPORT_LEGACY_DEEPFLATTENING
explicit SkEmbossMaskFilter(SkReadBuffer&);
+#endif
virtual void flatten(SkWriteBuffer&) const SK_OVERRIDE;
private:
« include/core/SkImageFilter.h ('K') | « include/effects/SkDropShadowImageFilter.h ('k') | include/effects/SkLayerRasterizer.h » ('j') | src/effects/SkLightingImageFilter.cpp » ('J')

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